Diameter (mm):

50.80

Angle of Incidence (°):

78

Fused Silica (Corning 7980)

Coating:

Dielectric Multilayer AR

Reflection (%):

>35

Surface Quality:

20-10

Thickness (mm):

5.08 ±0.1

Type:

Dichroic Filter

Parallelism (arcmin):

<5

Dimensional Tolerance (mm):

+0.0/-0.2

Wavelength Range (nm):

10 - 25

Surface Figure, RMS:

<λ/10 @ 633nm

Regulatory Compliance

RoHS:

Compliant

Certificate of Conformance:

View

Product Family Description

Separates EUV from the NIR Laser Source in High Harmonic Generation
Designed for High Damage Thresholds
Supports Applications from 10 – 40nm
Available from Stock
No Minimum Order Quantities, No Coating Lot Charges

Extreme Ultraviolet (EUV) Dichroic Filters, also known as beam separators, are intended for high harmonic generation applications by providing a high separation efficiency between the EUV and NIR wavelengths. Featuring a Fused Silica substrate, these filters support higher laser powers than the alternative Brewster’s angle beam separators and EUV filters. EUV Dichroic Filters feature a broad bandwidth range from 10nm to 40nm. In addition to high harmonic generation, these filters can also be used in systems that support EUV applications such as EUV lithography, EUV nanomachining, coherent diffractive imaging, and ultrafast attosecond pulse generation.

10-25nm, 50.8mm Dia, EUV/IR Dichroic Filter

Regulatory Compliance

Product Family Description